发明名称 |
Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap |
摘要 |
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
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申请公布号 |
US7307263(B2) |
申请公布日期 |
2007.12.11 |
申请号 |
US20040890404 |
申请日期 |
2004.07.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;LUIJKX CORNELIS PETRUS ANDREAS MARIA;SCHUURMANS FRANK JEROEN PIETER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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