| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method wherein stencil form is surely formed and lift-off process and peeling of substrates are easily performed, related to a method for forming geometric metal film on a substrate by lift-off method. SOLUTION: A lower layer resist film 13 is formed on a substrate 1, ultraviolet ray 4 is projected to raise development speed or the tower layer resist film 13, and then an upper layer resist film 14 is formed and the ultraviolet ray 4 is projected through a photo-mask 3, after that, the resist films 13 and 14 are developed in a developing liquid to form a stencil form 6. |
