CLEANER COMPOSITION FOR PROCESS OF MANUFACTURING SEMICONDUCTOR AND DISPLAY

摘要

The present invention relates to a cleaner composition for a process of manufacturing a semiconductor and a display. According to an embodiment of the present invention, a cleaner composition as an acid solution of pH 1 to 5 comprises: 0.01 to 5.0 wt% of an amino acid-based chelate agent; 0.01 to 1.5 wt% of organic acid; 0.01 to 1.0 wt% of inorganic acid; 0.01 to 5.0 wt% of a base compound; and the remainder of de-ionized (DI) water. The cleaner composition can increase the ability to remove metal impurities, thereby performing the functions of removing particles and organic pollutants, preventing copper corrosion, and avoiding reverse adsorption. Accordingly, adjustment of an etch rate may allow the cleaner composition to be used as various purposes of etching for copper, removal of residues, and a cleaner.