PERMANENT MASK RESIST, METHOD OF PRODUCING THE SAME, AND PERMANENT MASK RESIST LAMINATION SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a permanent mask resist having high resistance and insulation property to moisture without deteriorating flexibility, heat resistibility for soldering and chemical resistibility as the permanent mask resist, and provide a method of producing the permanent mask resist and a permanent mask resist lamination substrate. SOLUTION: The permanent mask resist includes a group showed by formula (I) where X represents a n-valent metallic ion, and n represents the valence of the metallic ion. Activating light rays are projected on a photosensitive resin composition on the substrate, and then a water-washing development process is carried out using water-washing liquid and developing solution mixing or dissolving the metallic ion, and thereby the permanent mask resist is produced.