| 摘要 |
PURPOSE: A wafer transfer apparatus for a diffusion equipment of a semiconductor is provided to reduce a wafer transfer time and a performing time by improving the structure. CONSTITUTION: A wafer transfer apparatus comprises a rotator(13), the first adsorbing part(13a) arrayed with a number of fork tweezers to the vertical direction and the second adsorbing part(13b) confronting with the first adsorbing part(13a). At this point, a number of wafers are continuously adsorbed by the first and second adsorbing parts(13a,13b). At this point, the first and second adsorbing parts(13a,13b) are formed on the same horizontal line. At this point, the rotator(13) is capable of having 3-5 adsorbing part on the same horizontal line. The wafer transfer apparatus further includes a carrier(20) and a boat(30).
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