| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which allows formation of a film of an even thickness with no change in film thickness near the edge of a substrate in a transportation direction when forming the film by passing the substrate through an area between electrodes wherein a plasma is generated. <P>SOLUTION: The plasma treatment apparatus forms a film on a substrate using a plasma generated by applying an electric field between a pair of opposed electrodes (9 and 10) under a pressure near the atmospheric one. The plasma treatment apparatus has such a structure as to allow the substrate to be passed between the electrodes, and one of the electrodes is divided into a plurality of portions, and a capacitor (13) is connected between each portion of the divided electrode (9) and a power supply (12). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
