发明名称 SUBSTRATE TABLE, APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR MANUFACTURING SUBSTRATE TABLE
摘要 A substrate table, a substrate processing apparatus and a method for manufacturing the substrate table are provided to restrain the nonuniformity of etching due to a convex portion of the substrate table itself by using a protruded peripheral portion. A substrate table(4) comprises a table body(4a), a plurality of convexities, and a peripheral portion. The plurality of convexities(7) are protruded from a reference surface(5a) of the table body. The peripheral portion(6a) encloses the reference surface. The peripheral portion has a larger height than those of the plurality of convexities, so that a substrate is capable of being loaded on the peripheral portion instead of the convexities. The peripheral portion has an upper flat surface.
申请公布号 KR20060132466(A) 申请公布日期 2006.12.21
申请号 KR20060053935 申请日期 2006.06.15
申请人 TOKYO ELECTRON LIMITED 发明人 HAYASHI KIYOSHI;SATOYOSHI TSUTOMU
分类号 H01L21/3065 主分类号 H01L21/3065
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