| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a surface plate suitable for polishing the levitation face of a thin film magnetic head using magneto- resistance effect type elements. SOLUTION: After machining the surface of a surface plate into a shape corresponding to the levitation face of a thin film magnetic head to be polished and before abrasive grains are buried in the surface of the surface plate, preliminary treatment for polishing is applied to the surface of the surface plate with the abrasive grain held by an elastic member. On account of which, the surface of the surface plate can be made flat, and abrasive grains of 0.1 μm or less in diameter can be buried in the surface of the surface plate. The roughness of the levitation face can be reduced by polishing the levitation face with the surface plate in which abrasive grains of 0.1 μm or less in diameter is buried, and electric short circuits of the MR elements on the levitation face can be prevented. |
