| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for photocurable nanoimprint excellent in long term storage stability, allowing easy pattern transfer even when a metal mold is pressed with a comparatively low pressure, excellent in adhesiveness with a substrate of the pattern, excellent in transferability of a nanoimprint pattern, and excellent in photocurability.SOLUTION: The composition for photocurable nanoimprint includes: (A) an organosilicon compound having a (meth)acrylic group; (B) a specific metal alkoxide; (C) a polymerizable monomer having a (meth)acrylic group; and (D) a photopolymerization initiator, but does not substantially contain water. |
