发明名称 |
ALKOXYSILANE/ORGANIC POLYMER COMPOSITION FOR THIN INSULATING FILM PRODUCTION AND USE THEREOF |
摘要 |
An alkoxysilane/organic polymer composition for the production of thin insulating films which comprises (A) a specific alkoxysilane, (B) a specific organic polymer, and (C) a solvent which is for the alkoxysilane (A) and the organic polymer (B) and comprises an organic solvent having an amide group and/or an ester group; a thin insulating film of a silica/organic polymer composite obtained by forming the composition into a thin film, subjecting the alkoxysilane in the thin film to hydrolysis and condensation with dehydration to cause the alkoxysilane to gel, and removing the solvent remaining in the film; and a thin porous silica film obtained from the thin composite film by removing the organic polymer therefrom. The two films not only have a low permittivity and are suitable for use as an insulating layer for a multilayer wiring structure of a semiconductor element, but also can be produced by a method easily practicable in current semiconductor element production processes. |
申请公布号 |
WO9903926(A1) |
申请公布日期 |
1999.01.28 |
申请号 |
WO1998JP03186 |
申请日期 |
1998.07.15 |
申请人 |
ASAHI KASEI KOGYO KABUSHIKI KAISHA;IOKA, TAKAAKI;TANABE, TSUNEAKI |
发明人 |
IOKA, TAKAAKI;TANABE, TSUNEAKI |
分类号 |
C08L83/04;B32B27/00;C08J5/18;C08K5/10;C09D183/02;C09D183/12;C09D183/14;H01L21/312;H01L21/316;H01L21/768;H05K1/00 |
主分类号 |
C08L83/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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