| 摘要 |
PROBLEM TO BE SOLVED: To perform highly accurate evaluation with G excellent reproducibility by preventing a foreign matter from being stuck on a pattern surface when inspecting the defect of a pattern formed on an exposure mask. SOLUTION: The pattern of the exposure mask 10 where the pattern of light shielding film 12 constituted of chromium is formed on a transparent substrate 11 constituted of quartz is optically measured and evaluated. Then, an electrically conductive thin film layer 13 which is transparent to light for measuring the pattern is provided on the full surfaces of the transparent substrate 11 and the light shielding film 12, and the thin film layer 13 is grounded so as to perform measurement and evaluation. |
