发明名称 SEMICONDUCTOR ELEMENT AND DETECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor element which can measure a side etching amount of a concavity or a through hole which is formed on a silicon substrate.SOLUTION: A semiconductor element comprises scale members 15b, 15c which are arranged via an insulation film 11, on a silicon substrate 1 including a cavity 3 formed by a concavity. The scale members 15b, 15c are arranged on ends of the cavity 3. Ends of the scale members 15b, 15c are located closer to a central part of the cavity 3 than lateral faces of the cavity 3. The cavity 3 is formed by crystal anisotropic etching of silicon. The semiconductor element further comprises resistor bodies 5 each arranged on the cavity 3 in a bridging manner.SELECTED DRAWING: Figure 1
申请公布号 JP2016127213(A) 申请公布日期 2016.07.11
申请号 JP20150001897 申请日期 2015.01.07
申请人 RICOH CO LTD 发明人 SETO MASAMI
分类号 H01L21/306;B81B1/00;G01N25/64 主分类号 H01L21/306
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