发明名称 CHEMICALLY GROWING FURNACE IN GAS PHASE
摘要 PURPOSE:To prevent carbon powder formed by the friction between a substratum heater and a ring shaped supporter both made of carbon from flying above the heater by setting up a looped plate eave which is coaxial with the substratum heater at the side of the rotating substratum heater in a chemically growing furnace of vertical type.
申请公布号 JPS5360382(A) 申请公布日期 1978.05.30
申请号 JP19760135782 申请日期 1976.11.10
申请人 MITSUBISHI ELECTRIC CORP 发明人 NISHIMOTO AKIRA;MIYOSHI HIROKAZU
分类号 C23C16/46;C23C14/54;H01L21/205 主分类号 C23C16/46
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