| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for removing the residue of a plasma etched polymer form a substrate such as an electronic device. SOLUTION: The composition contains one or more first polymer dissolution promoting bases selected from tetra(1-6C)alkylammonium hydroxides, tetra(1-6C) alkylammonium carbonates, tetra(1-6C)alkylammonium acetates, tetra(1-6C) alkylammonium citrates and tetra(1-6C)alkylammonium silicates, one or more second polymer dissolution promoting bases selected from hydroxylamines, hydroxylamine formates and hydroxylamines each buffered with a carboxylic acid and one or more polar aprotic solvents. |
