| 摘要 |
PURPOSE:To form easily a minute resist pattern by providing >=1 through holes on a photomask where there is no trouble with respect to its pattern. CONSTITUTION:A photosensitive resin layer 2 is laminated on a substrate 1 made of copper-plated stainless steel, etc., and then a photomask 3, which has holes 5 at four locations on the diagonal lines in an art work pattern, is adhered securely to be exposed after vacuum suction. Subsequent to the removal of the photomask 3, a resist pattern is obtained by development. Since bubbles are removed by virtue of the holes provided, a minute resist pattern is formed easily. |
