发明名称 MXN ARRAY OF THIN FILM ACTUATED MIRROR AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To provide an M×N thin film actuated mirror array for an optical projection system which can prevent oxidation in a thin film sacrificial layer and to provide its production method. SOLUTION: An active matrix 210 is prepared, on which a passivation layer 220 and prevention layer 230 against flowing of an etching liquid are formed, and further, a thin film sacrificial layer 240 is formed by vapor deposition on the prevention layer 230 against flowing of an etching liquid. An antioxidant layer 250 is formed on the thin film sacrificial layer 240 by vapor deposition to form an array of M×N pairs of vacant slots 245. An elastic layer 260 is formed on the antioxidant layer 250 by vapor deposition and an array of M×N conduits 216 is formed and further a second thin film layer 270, thin film layer 280 which can electrically deform, and first thin film layer 290 are successively formed on the elastic layer 260 by vapor deposition to obtain a multilayered structure. The multilayered structure is patterned to form an array of a M×N actuated mirror structure. Then the thin film sacrificial layer 240 is removed to form an array 300.
申请公布号 JPH1090612(A) 申请公布日期 1998.04.10
申请号 JP19970231198 申请日期 1997.08.27
申请人 DAEWOO ELECTRON CO LTD 发明人 GU MEIKEN;GEN MINSHOKU
分类号 G02B5/08;G02B26/08;H04N5/74;(IPC1-7):G02B26/08 主分类号 G02B5/08
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