Device and method for flat holding of a substrate in microlithography

摘要

A system for holding substrates in microlithography to prevent flatness errors. Deflections cause by gravity bend the surface of the substrate. Spacer elements are provided between the table and the substrate to hold the substrate in a horizontal position. The rim of the substrate is sealed, so that a chamber is formed containing air. Different air pressure can be provided on different sides of the substrate in order to prevent deflection.