发明名称 METHOD AND SYSTEM FOR CONTROLLING RETICLE MASKING BLADE, AND LEVITATION APPARATUS FOR OF RETICLE MASKING BLADE
摘要 PROBLEM TO BE SOLVED: To provide a REMA-blade stage mechanism supporting guided motion of a REMA blade in high-vacuum environment, in addition, supporting several degrees of freedom of the motion. SOLUTION: The mechanism has a REMA (reticle-masking) blade system including a REMA blade, a REMA-blade carriage assembly, a set of electromagnetic-force actuators, an electromagnetic linear motor, a sensor set, and a servo mechanism. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004363605(A) 申请公布日期 2004.12.24
申请号 JP20040164966 申请日期 2004.06.02
申请人 ASML HOLDING NV 发明人 GALBURT DANIEL N;CARTER FREDERICK M;ROUX STEPHEN
分类号 G03F7/20;G03B27/42;G03B27/72;G05B11/32;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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