| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion multiple exposure method capable of reducing pattern defects in executing multiple exposure; and an immersion exposure system. <P>SOLUTION: This immersion multiple exposure method includes: a first exposure process (step 7) of subjecting a photoresist film formed on a substrate to immersion exposure by using a first mask; a cleaning process (step 8) of cleaning a surface of the substrate; and a second exposure process (step 9) of subjecting the photoresist film to immersion exposure by using a second mask; and is characterized in that there is no heating treatment between the first exposure process and the second exposure process. By executing a surface cleaning treatment to remove dust adhering to a surface of the photoresist film or a protective film, pattern defects caused by the duct in the second exposure process is reduced. <P>COPYRIGHT: (C)2009,JPO&INPIT |
