| 摘要 |
PURPOSE:To provide a composition composed of an addition-polymerizable compound having ethylenic unsaturated group, a compound containing coumarin skeleton and an organic peroxide, having high sensitivity to visible light and excellent processability and storage stability and useful as a resist material, etc. CONSTITUTION:The objective composition is produced by using (A) an addition- polymerizable compound having >=1 ethylenic unsaturated group (e.g. acrylic acid) as a raw material, (B) a compound having coumarin skeleton and expressed by formula [A is cyano or -ZR6 (R6 is 1-10C alkyl, etc.; Z is CO, etc.); R1 is H, 1-4C alkyl or 6-12C aryl; R2-R5 are H, 1-6C alkyl, etc.] (e.g. 3-cyanocoumarin) as a photo-polymerization initiator and (C) an organic peroxide (e.g. methyl ethyl ketone peroxide). The amounts of the components B and C are 0.1-10pts.(wt.) (preferably 0.5-5pts.) and 0.1-10pts. (preferably 0.5-7pts.) per 100pts. of the component A. |
