发明名称 |
MULTI-LAYER RESIST |
摘要 |
<p>A multi-layer resist comprising (A) a layer of a Langmuir-Blodgett film, (B) a layer of at least one thin film and (C) a substrate, said layer (B) being placed between said layer (A) and said substrate (C). The multi-layer resists of the invention are applicable to ultra fine processing on the order of submicron, half-micron or quater-micron, and the number of defects can be remarkably decreased.</p> |
申请公布号 |
EP0384328(A3) |
申请公布日期 |
1991.03.27 |
申请号 |
EP19900103090 |
申请日期 |
1990.02.17 |
申请人 |
KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA |
发明人 |
UEKITA, MASAKAZU;AWAJI, HIROSHI;MIZUNUMA, SATOSHI |
分类号 |
G03F7/09;(IPC1-7):G03F7/09 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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