发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide a positive photosensitive resin compsn. excellent in compatibility with an alkali-soluble resin and showing excellent stability as a soln. or electrodeposition liquid by incorporating a specified positive photosensitive compd. as the essential component. CONSTITUTION:This positive photosensitive resin compsn. contains (a) quinone diazide phenol resin expressed by formula and (b) alkali-soluble resin as the essential components. In formula, R<1> is an alkyl group of 1-4 carbon number, R<2> is a bivalent hydrocarbon residue having 5-16 carbon number, D1, D2, D3 are hydrogen atoms or quinone diazide units. When a resin having carboxylic acid groups is used as the alkali-soluble resin, the obtd. positive photosensitive resin compsn. is suitable for an electrodeposition coating. Further, the obtd. coating film of this positive photosensitive resin by electrodepostion has excellent adhesion property to a substrate and can be formed into a fine wiring pattern.
申请公布号 JPH0683048(A) 申请公布日期 1994.03.25
申请号 JP19930048199 申请日期 1993.03.09
申请人 NIPPON OIL CO LTD 发明人 YODA EIJI;YUASA HITOSHI;OTSUKI YUTAKA
分类号 C08L65/00;G03F7/023;H01L21/027;H05K3/00;(IPC1-7):G03F7/023 主分类号 C08L65/00
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