| 发明名称 |
Process depending on plasma discharges sustained by inductive coupling |
| 摘要 |
A process for fabricating a product 28, 119. The process comprises the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a gaseous discharge excited by a high frequency field in which the vector sum of currents to phase and inverse-phase capacitive coupled voltages from the inductive coupling structure can be selectively maintained.
|
| 申请公布号 |
US6858112(B2) |
申请公布日期 |
2005.02.22 |
| 申请号 |
US19960748746 |
申请日期 |
1996.11.18 |
| 申请人 |
HITACHI KOKUSAI ELECTRIC CO., LTD.;FLAMM DANIEL L |
发明人 |
FLAMM DANIEL L.;VINOGRADOV GEORGY K.;YONEYAMA SHIMAO |
| 分类号 |
C23C16/50;C23C16/505;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):C23C16/00;C23F1/00 |
主分类号 |
C23C16/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
