发明名称 STAGE DEVICE, EXPOSURE SYSTEM, METHOD OF DEVICE MANUFACTURE, AND DEVICE
摘要 <p>An exposure system comprises a surface plate (58) for holding the tube of an optical projection system (PL), driving mechanisms (86A, 86B) for driving a stage (WST); frames (84A, 84B) isolated from the surface plate (58) and adapted to receive the reaction force from the stage (WST) being driven; and a damping material (85) provided on the frame. The vibrations and the reaction force of the frame due to the reaction force from the stage being driven are attenuated by the damping material and transmitted to the earth (floor). Therefore, the vibrations transmitted from the earth to the surface plate can be effectively decreased. Since the frame and the surface plate are independent of each other in terms of vibration, the optical projection system is not affected by the reaction force or the vibrations of the frame due to the reaction. As a result, the effects of the vibrations of the various parts of the system on exposure accuracy decrease.</p>
申请公布号 WO2000025352(P1) 申请公布日期 2000.05.04
申请号 JP1999005928 申请日期 1999.10.27
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