发明名称 POLYIMIDE FILM, ITS MANUFACTURING METHOD AND METALLIC WIRING PLATE USING THE SAME AS BASE
摘要 PROBLEM TO BE SOLVED: To provide a polyimide film having an excellent high elastic modulus, low thermal expansion coefficient, alkali etching properties, and film-forming properties when the polyimide film is applied to a metallic wiring plate base for a flexible printing circuit applying a metallic wiring to its surface, CSP, BGA, or a TAB tape, and to provide a manufacturing method of the polyimide film, and a metallic wiring circuit plate using the film as a base. SOLUTION: The polyimide film is obtained by copolymerizing pyromellitic dianhydride, phenylenediamine, methylene-dianiline, and 3,4'-oxy-dianiline at a specified mole ratio thereof.
申请公布号 JP2002155140(A) 申请公布日期 2002.05.28
申请号 JP20010251095 申请日期 2001.08.22
申请人 DU PONT TORAY CO LTD 发明人 UHARA KENJI;YASUDA MASABUMI;SAWAZAKI KOICHI
分类号 C08J5/18;B29C41/24;B29K79/00;B29L7/00;C08G73/10;H01L21/60;H05K1/03;(IPC1-7):C08G73/10 主分类号 C08J5/18
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