发明名称 Heterojunction organic semiconductor field effect transistor (FET) with a gate insulation layer and manufacturing process thereof
摘要 A organic semiconductor field effect transistor that can work in the depletion mode or super-inverse mode, comprising: a substrate (1), a gate electrode (2) formed on the substrate (1), a gate insulation layer (3) formed on the substrate (1) and the gate electrode (2), a first semiconductor layer (4) formed on the gate insulation layer (3), a source electrode and a drain electrode (5) formed on the first semiconductor layer (4), and a second semiconductor layer (6) formed on the first semiconductor layer (4) and the source/drain electrodes (5).
申请公布号 US6806492(B2) 申请公布日期 2004.10.19
申请号 US20030614987 申请日期 2003.07.09
申请人 CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY CHINESE ACADEMY OF SCIENCE 发明人 YAN DONGHANG;ZHANG JIAN;WANG JUN;WANG HAIBO;YAN XUANJUN
分类号 H01L51/05;H01L29/76;H01L29/786;H01L35/24;H01L51/00;H01L51/30;H01L51/40;(IPC1-7):H01L35/24 主分类号 H01L51/05
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