METHOD FOR MANUFACTURING A PHASE SHIFT MASK

摘要

PURPOSE: A fabrication method of a phase shift mask is provided to prevent a position shifting phenomenon by simultaneously setting a phase shifting region and a non-shifting region. CONSTITUTION: The method comprises the steps of forming a light shading film(42) on a substrate(40); simultaneously exposing a first and a second regions(A, 42b) of the substrate(40) by patterning the light shading film(42), wherein the width of the first region(A) is wider than that of the second region(42b); forming a groove(46) in the first region(A) of the substrate; and removing the light shading pattern(42a) formed between the groove(46) and the second region(42b). The first region(A) of the substrate(40) is a phase shifting region and the region between the groove(46) and the second region(42b) is non-shifting region.