| 摘要 |
An LCD TFT array substrate and a fabricating method thereof are provided to define a TFT structure of a TFT area, accumulation capacitance and a data line of the capacitance area, and two terminal structures at the same time to reduce the number of the photo masks, thereby decreasing the manufacturing cost of the LCD. A scanning trench has at least one TFT area(106a), a scanning area, and a first terminal area. A capacitance trench has at least one capacitance area(108b) and a second terminal area. A first metal layer(112), a dielectric layer(114), a silicon layer(116), and a doped silicon layer(118) are sequentially formed at the screening trench and the capacitance trench. A second metal layer is formed on the doped silicon layer and the transparent conductive layer. A TFT structure of a TFT area, accumulation capacitance and a data line of the capacitance area, and two terminal structures are defined at the same time by photolithography and etching processes. Thereby, the number of the photo masks is reduced. |
