APPARATUS AND METHODS FOR NANOLITHOGRAPHY USING NANOSCALE OPTICS

摘要

An apparatus and methods for nanolithography using nanoscale optics are disclosed herein. Submicron-scale structures may be obtained using standard photolithography systems (710) with a de-magnifying lens (600). A de-magnifying lens (600) for use in a standard photolithography system (710) includes a film (670) having a top surface (610), a bottom surface (620) and a plurality of cylindrical channels (160) containing a dielectric material (280); and an array of carbon nanotubes (640) penetrating the film (670) through the plurality of cylindrical channels (160), wherein an image on the top surface (610) of the film (670) is converted into a de-magnified image on the bottom surface (620) of the film (670) by the carbon nanotubes (640).