COMPOSITE INSULATING FILM

摘要

PURPOSE:To improve the reliability while making production process of a device easier by a method wherein the composition ratio of constituent materials is continuously changed in the thickness direction so that the etching speed may be slowly accelerated from the backside to the surface of the titled film. CONSTITUTION:The space ratio of a sputtered surface of a composite insulating film is continuously changed during sputtering process utilizing e.g. an independently movable sputtering target device for sputtering materials. For example, a composite insulating film composed of aluminium oxide and tantalum oxide is effectively etched making gentle taper angles subject to the composition ratio increased from the backside to the surface of the composite insulating film. Next a metal wiring layer 2, the composite insulating film 3 and a photoresist layer 4 and provided on a glass substrate 1 and then sides 5 may be made into gentle taper angles by means of etching process subject to specified patterning. Resultantly any disconnection due to a step difference in a removed part of a metal wiring layer 6 may be prevented from occurring.