发明名称 FORMING A CONDUCOR CIRCUIT ON A SUBSTRATE
摘要 Disclosed is a process for forming a conductor pattern on a face of a substrate, which is typically sorbing and porous, such as paper or cloth. The method comprises forming on the surface an exposed pattern of colloid particles, corresponding to the conductor pattern to be formed. The colloid particles suitable for use according to the invention are those that are capable of catalyzing electroless deposition of copper, silver, gold, and the like. After the exposed pattern of colloid particles is formed, precipitation of a metal substance on said face is caused, to form said conductor pattern.
申请公布号 WO02056650(A2) 申请公布日期 2002.07.18
申请号 WO2002IB00009 申请日期 2002.01.07
申请人 YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW;SHIPWAY, ANDREW, N.;WILLNER, ITAMAR 发明人 SHIPWAY, ANDREW, N.;WILLNER, ITAMAR
分类号 C23C18/18;C23C18/16;C23C18/31;H05K3/10;H05K3/18;H05K3/46 主分类号 C23C18/18
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