| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam aligner which can cool effectively an electron beam shaping member for shaping sectional forms of a plurality of electron beams. SOLUTION: This electron beam aligner wherein a pattern is exposed on a wafer by using a plurality of electron beams is provided with an electron beam generating part for generating the plural electron beams, and a first electron beam shaping member for shaping sectional forms of the plural electron beams. The first electron beam shaping member is provided with base substance, a plurality of shaping aperture parts which are disposed on the base substance and shape sectional forms of the plural electron beams, and a first cooling path which is disposed on the base substance and passes refrigerant for cooling the base substance.
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