| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist applying system which reduces a dissolved gas in a photoresist liquid that is applied to a glass master disc without using a special deaerator. <P>SOLUTION: The resist applying system 100 comprises a resist tank 6 which stores the photoresist liquid 5 applied to the glass master disc 1 and is kept in a given depressurized state, a liquid supply pipe 3 through which the photoresist liquid 5 applied to the glass master disc 1 is transferred, an inner pressure adjusting means which adjusts the inner pressure of the resist tank 6 to a given level, and a check valve 19 which is arranged in the middle of the liquid supply pipe 3 to prevent a backflow of the photoresist liquid 5. The resist applying system 100 prevents gas from dissolving into the photoresist liquid 5 without having a large-scale deaerator, remarkably reducing a defect that is caused by the foaming of the dissolved gas after the application of the photoresist liquid 5 to the glass master disc 1. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
