SUBSTRATE TRANSPOTING APPARATUS AND CHEMICAL MECHANICAL POLISHING APPARATUS WITH IT

摘要

A substrate transfer apparatus and a CMP apparatus having the same are provided to automatically turn over a substrate when the substrate is transferred from a polishing section to a cleaning section. A support member(110) has a support surface(112) for supporting a surface of a substrate which is to be processed. The substrate supported by the support surface is held by a release prevention member(114) having a stepped portion(114a) and a driving clamp(114b). The stepped portion protrudes from a front end of the support surface, and the driving clamp protrudes from a rear end of the support surface. The support member is rotated by a driving unit(120) to turn over the substrate supported by the support surface. The support member has a driving shaft(122) coupled to a rear end of the support member and a guide part(134) for guiding reciprocating motion of the driving unit.