| 摘要 |
<p>PURPOSE:To improve resolution and depth of focus by interfering the light transmitted through position shift parts in respective transmittable regions and the light transmitted through the parts not formed with the shift parts so as to weaken each other in the boundary parts of the transmittable regions and light shielding regions at the time of exposing. CONSTITUTION:Metallic layers 3 are patterned and formed to prescribed shapes on the main surface of a substrate 2. The metallic layers 3 serve as the light shielding regions A at the time of exposing. On the other hand, the transparent films 4a of the phase shift parts to shift the phase of the transmitted light are formed in a part of the transmittable regions B. A phase difference arises between the light transmitted through the transparent films 4a and the light transmitted through the regions having no transparent films 4a of the light transmitted through the respective transmittable regions B at the time of exposing and these light rays weaken each other in the boundary parts of the light shielding regions A and the transmittable regions B. The blur in the contour parts of the images projected onto a wafer is, therefore, decreased. The resolution and the depth of focus are improved in this way.</p> |
