| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a system for changing optical characteristics in an adjustable resist usable for manufacturing an electron device such as an integrated circuit. <P>SOLUTION: The method and the system for improving precision in measurement using optical measurement are provided. Further the method and the system using an adjustable resist layer are provided. The adjustable resist layer provides first and second sets of optical characteristics before and after exposure, respectively. <P>COPYRIGHT: (C)2008,JPO&INPIT |
