发明名称 BARRIER SEAL FOR ELECTROSTATIC CHUCK
摘要 PROBLEM TO BE SOLVED: To provide a barrier seal for use with an electrostatic chuck, improving the yield of products manufactured by the electrostatic chuck.SOLUTION: A barrier seal for an electrostatic chuck 10 in a plasma etching process includes a plurality of sealing portions to block a connecting layer 12 of the electrostatic chuck 10 and plasma gas. A groove 14 of the electrostatic chuck 10 is completely filled by the barrier seal.EFFECT: Even one of the plurality of sealing portions is destroyed in the plasma etching process by the plasma gas, the barrier seal still prevents leaking of the electrostatic chuck 10 effectively. The barrier seal provides a buffer period for engineers to replace the damaged barrier seal before the leaking occurs. Danger of leaking caused by abrupt breaking of the barrier seal is reduced. Furthermore, the barrier seal facilitates stability and safety of the plasma etching process.SELECTED DRAWING: Figure 1
申请公布号 JP2016152414(A) 申请公布日期 2016.08.22
申请号 JP20160020365 申请日期 2016.02.05
申请人 MFC SEALING TECHNOLOGY CO LTD 发明人 CHANG YO-YU;HUANG CHUN-YAO
分类号 H01L21/683;H01L21/3065;H02N13/00 主分类号 H01L21/683
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