发明名称 |
REAL-TIME PREDICTION OF PROXIMITY RESIST HEATING AND CORRECTION OF RASTER SCAN ELECTRON BEAM LITHOGRAPHY |
摘要 |
The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A shifted impulse response function is shown to give proximity heating results accurate to within a few percent. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds. |
申请公布号 |
WO0101440(A1) |
申请公布日期 |
2001.01.04 |
申请号 |
WO2000US17706 |
申请日期 |
2000.06.27 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
INNES, ROBERT;BABIN, SERGEY;TEITZEL, ROBIN;VENEKLASEN, LEE |
分类号 |
G03F7/20;G03F1/78;H01J37/04;H01J37/304;H01J37/305;H01J37/317;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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