发明名称 CONTROLLING SYSTEM FOR FIXED LIGHT QUANTITY OF REDUCTION PROJECTING EXPOSURE DEVICE
摘要 PURPOSE:To measure the quantity of exposure accurately, by arranging an illuminance sensor on a shutter. CONSTITUTION:A reticle 6 is illuminated with the light of a lamp 1 which is condensed by a converging lens 2, and its image is projected to a water 7 through a reduction lens 5. An illuminance sensor 8 which inputs an exposure intensity signal to an integration controlling circuit 4 is attached onto a shutter 6. Since the illuminance sensor 8 is arranged on a light path 9 while the shutter 6 is closed, the intensity of the illumination light is measured accurately.
申请公布号 JPS5835529(A) 申请公布日期 1983.03.02
申请号 JP19810134143 申请日期 1981.08.28
申请人 HITACHI SEISAKUSHO KK 发明人 TSUYUKI HISAMASA;HAYASHI SOUICHIROU
分类号 G03B27/72;(IPC1-7):03B27/72 主分类号 G03B27/72
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