发明名称 Inspection apparatus and method for detecting flaws on a diffractive surface.
摘要 <p>An optical inspection system and method for detecting flaws on a diffractive surface such as a reticle or wafer, includes illuminating a surface to be inspected to generate a first scattered energy angular distribution in response to a flaw on the surface and a second scattered energy angular distribution in response to an unflawed surface; the first and second energy distributions are sensed and the minimum energy detection energy level is established; determining whether the minimum detected energy level is in a first or second predetermined energy range and indicating that no flaw is present when the minimum detected energy level is in the first range and a flaw is present when the minimum detected energy level is in the second range.</p>
申请公布号 EP0406030(A2) 申请公布日期 1991.01.02
申请号 EP19900400529 申请日期 1990.02.26
申请人 QC OPTICS, INC. 发明人 JOHNSON, CARLY E.;ORMSBY, JAY L.;CHASE, ERIC T.;QUACKENBOS, GEORGE S.;BROUDE, SERGEY V.;BOUDOUR, ABDU
分类号 G06T1/00;G01N21/88;G01N21/94;G01N21/956 主分类号 G06T1/00
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