| 摘要 |
A photosensitive polymerisable composition, which comprises at least one cyclic and/or oligomeric compound composed of structural units of formula (I), wherein R is identical or different radicals of formula -(A)-O-C(O)-C(R1)=CH2, and R1 is hydrogen or methyl, A is a transition group, and n is an integer from 3 to 18, preferably 3 or 4 and, most preferably, 3, and the use of this composition as photostructurable solder stopping resist for the production of solder masks for printed circuit boards. |
