| 发明名称 |
Nitrogen-containing organic compound, chemically amplified resist composition and patterning process |
| 摘要 |
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
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| 申请公布号 |
US7261995(B2) |
申请公布日期 |
2007.08.28 |
| 申请号 |
US20050110927 |
申请日期 |
2005.04.21 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE TAKERU;HASEGAWA KOJI;TAKEMURA KATSUYA;NODA KAZUMI |
| 分类号 |
G03C1/73;G03F7/004;C07D493/08;G03C1/492;G03F7/039;G03F7/075;H01L21/027 |
主分类号 |
G03C1/73 |
| 代理机构 |
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