发明名称 |
HOME PORT, APPARATUS FOR TREATING SUBSTRATE INCLUDING THIS AND METHOD FOR COMPOSING ATMOSPHERE |
摘要 |
The present invention relates to a home port in which a nozzle for discharging a processing solution stands by wherein the processing solution discharged by the nozzle is outputted through the home port and a substrate treatment device including the home port. According to an embodiment of the present invention, the home port comprises: a discharging space to which the nozzle discharges the processing solution; and an atmosphere composing unit configured to compose an atmosphere in the discharging space by an atmosphere composing solution. The atmosphere composing unit comprises a container accommodating the atmosphere composing solution and an ultrasonic wave applying member configured to apply ultrasonic wave vibration to the atmosphere composing solution accommodated in the container. The atmosphere composing solution sprayed by the ultrasonic wave applying member is supplied to the discharging space. |
申请公布号 |
KR20160081300(A) |
申请公布日期 |
2016.07.08 |
申请号 |
KR20140194912 |
申请日期 |
2014.12.31 |
申请人 |
SEMES CO., LTD. |
发明人 |
SHIN, KYUNG SIK;SHIN, WON KI |
分类号 |
H01L21/027;H01L21/02;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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