DEPOSITING METHOD BY VACUUM EVAPORATION,申请号JP19770100496-传众专利搜索

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发明名称	DEPOSITING METHOD BY VACUUM EVAPORATION
摘要	PURPOSE:To form coating without contamination due to impurities, by effecting blank deposition prior to the proper run of deposition by vacuum evaporation of material to be evaporated contained in and electroconductive, composite ceramic boat.
申请公布号	JPS5435176(A)	申请公布日期	1979.03.15
申请号	JP19770100496	申请日期	1977.08.24
申请人	HITACHI LTD	发明人	NARUSHIMA MASACHIKA
分类号	C23C14/26;C23C14/24	主分类号	C23C14/26
代理机构		代理人
主权项
地址

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