发明名称 PLASMA DEVICE
摘要 PURPOSE:To stably produce the discharged plasma in a discharge space regardless of the level of power supply frequency. CONSTITUTION:Assuming a capacitor alternately coupling feed electrodes 1, 2 with metallic pipes (metallic bodies) 13, 23 as a capacitance C, inductors 100 are inserted into the plasma device in parallel with the capacitor specifying the inductance C of the inductors 100 to be 1/{(2pif)<2>C} for cancelling the effect of the capacitance C.
申请公布号 JPH0799351(A) 申请公布日期 1995.04.11
申请号 JP19930315565 申请日期 1993.12.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 FUJISHITA NAOMITSU;MURAKAMI EISHIN;KUZUMOTO MASAKI;NISHIMAE JUNICHI;YOSHIZAWA KENJI;TAKENAKA YUJI
分类号 H05H1/46;H01S3/00;H01S3/038;H01S3/0971;H01S3/0975;(IPC1-7):H01S3/038;H01S3/097 主分类号 H05H1/46
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