BASE POLYMER FOR RESIST COMPOSITION, RESIST MATERIAL AND METHOD FOR FORMING PATTERN

摘要

PROBLEM TO BE SOLVED: To obtain a chemical amplification negative type resist material having a high cross-linking efficiency and a high sensitivity. SOLUTION: This base polymer for a chemical amplification negative type resist comprises a recurring unit represented by general formula (1) (wherein R1 is a 1-10C linear, branched or cyclic alkyl group in which the carbon atom directly bonded to the oxygen atom is primary or secondary; R2 is hydrogen atom or a 1-10C linear, branched or cyclic alkyl group; m and n are each 0