| 摘要 |
<p>A recirculating chemical bath arrangement includes a quartz process tank, and a sump chamber disposed directly adjacent to the process tank. A trough extends about the top portion of the outer walls of the process tank, the trough being inclined to cause gravital flow toward the sump chamber. The sump chamber includes a fitting in the bottom thereof which directs liquid from the sump into a pump/filter circuit, the output of which is fed into the bottom of the process tank. The liquid is thus caused to overflow the process tank and spill into the trough, and flow into the adjacent sump chamber. A plurality of heater units are secured to the exterior surface of the process tank to heat the liquid therein to the proper process temperature. The sump chamber is unheated, so that the liquid entering the pump/filter is at the coolest temperature of the liquid flow cycle. The process tank and sump chamber may be formed integrally of molded and welded quartz plates, and disposed within an outer case that contains thermal insulation.</p> |
