| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern correcting method of layout data by which a data throughput and processing time are greatly shortened. SOLUTION: The pattern correcting method uses the architecture layout data of a pattern designed by an automatic layout apparatus as an input. Firstly, an environmental profile expressed in a specific form is determined on the basis of whether or not other graphics are present in the circumference about each cell for correction included in the inputted architecture layout data. Then, a replacement cell name being the name of a correction pattern to be replaced corresponding to the determined environmental profile is read by referring to a cell replacement table to generate the layout data after correction. The correction pattern corresponding to the read replacement cell name is captured from a cell library. In order to determine the environmental profile, the circumference of the cell for correction is divided into a plurality of segments, and a result is expressed in a binary on the basis of whether or not other graphics are present in each segment. |
