发明名称 DESIGN METHOD AND DESIGN DEVICE OF SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 <p>Chip size and cost can be prevented from increasing. Capacitance and resistance depending on the layout of wiring formed for a plurality of wiring layers (S11-S16) are extracted as a capacitance/resistance file (S17), a best-worst capacitance/resistance file defining capacitance and resistance while taking account for variations in wiring for every wiring layer is created (S18) with reference to a best-worst coefficient file storing coefficients of best and worst conditions of variations in capacitance and resistance for every one of a plurality of wiring layers, and timing verification of wiring is performed (S19) based on the best-worst capacitance/resistance file.</p>
申请公布号 WO2008114397(A1) 申请公布日期 2008.09.25
申请号 WO2007JP55566 申请日期 2007.03.19
申请人 USHIYAMA, KENICHI;FUJITSU MICROELECTRONICS LIMITED 发明人 USHIYAMA, KENICHI
分类号 H01L21/82 主分类号 H01L21/82
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