| 摘要 |
PROBLEM TO BE SOLVED: To provide a microwave plasma treatment device capable of achieving plasma treatment high in in-plane uniformity by micro plasma containing ions by controlling an ion distribution. SOLUTION: In this microwave plasma treatment device 100 which forms plasma of a treatment gas in a chamber 1 by microwaves radiated from microwave radiation holes 32 of a planar antenna 31 and having permeated this microwave permeable plate 28, and applies a plasma treatment to a treatment object W mounted on a mounting base 2 by the plasma, the microwave permeable plate 28 has an uneven part 42 in a part of its microwave permeable surface corresponding to a peripheral part of the treatment object, and a part thereof corresponding to the central part of the treatment object W is formed into a flat part 43. COPYRIGHT: (C)2009,JPO&INPIT |
